Impact of Gate Oxide Thickness Variations on Hot-Carrier Degradation

Tyaginov, Stanislav; Starkov, Ivan; Triebl, Oliver; Karner, M.; Kernstock, Ch.; Jungemann, Christoph; Enichlmair, Hubert; Park, J. M.; Grasser, Tibor

Piscataway, NJ] : IEEE (2012)
Contribution to a book, Contribution to a conference proceedings

In: 2012 19th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) : [SINGAPORE JUL 02-06, 2012]
Page(s)/Article-Nr.: 5 S.

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