Impact of Gate Oxide Thickness Variations on Hot-Carrier Degradation
Tyaginov, Stanislav; Starkov, Ivan; Triebl, Oliver; Karner, M.; Kernstock, Ch.; Jungemann, Christoph; Enichlmair, Hubert; Park, J. M.; Grasser, Tibor
Piscataway, NJ] : IEEE (2012)
Contribution to a book, Contribution to a conference proceedings
In: 2012 19th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) : [SINGAPORE JUL 02-06, 2012]
Page(s)/Article-Nr.: 5 S.
Identifier
- DOI: 10.1109/IPFA.2012.6306265
- RWTH PUBLICATIONS: RWTH-CONV-200031